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Achromatizing photolithographically patterned metasurfaces with arbitrary, variable unit cell size

delete2024-12-11
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OA
AI
S
Skyler Palatnick *
M
Maxwell A. Millar‐Blanchaer
J
J. Kent Wallace
D
Demis D. John
M
Moore, Anjali
T
Tobias Wenger
DOI:10.1364/OE.544000delete
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摘要

摘要

En 中文
In recent years, across many fields, a large emphasis has been placed on the development of optical materials that can realize arbitrary control over the phase, transmission, and polarization of light, particularly across a broad wavelength range. Metasurface optics, or arrays of subwavelength structures with highly tailorable geometry and composition on a thin substrate, have emerged as a promising contender to fulfill these needs. Several methods for the achromatization of metasurfaces have been demonstrated, including the use of amorphous nanopost shapes as well as multiple, simple nanopost shapes. We present what we believe to be a novel technique that can be used separately or in conjunction with these techniques to provide achromatic phase control: arbitrary aperiodicity. By varying the period, or spacing between adjacent nanoposts, metasurfaces can be demonstrated that achieve desirable phase behavior and high transmission over a relatively large bandwidth. We detail the design and fabrication of such a device, in the form of a 1 cm diameter polarization insensitive metasurface with a vortex phase profile that exhibits achromatic behavior over a similar to 12% bandwidth centered at 1650 nm. We demonstrate simulated phase residuals below 0.4 rad and transmission above 85% for this bandwidth, as well as measured phase residuals below 0.6 rad and transmission above 88% for this bandwidth. By showing that we can create such a device with deep-UV photolithographic fabrication techniques, we make clear the fidelity of our aper iodic technique in realizing mass-manufactureable, large-area achromatic metasurfaces for the near-infrared. (c) 2024 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
Keyword:
DIELECTRIC METASURFACES
POLARIZATION
METALENSES
RESOLUTION
LENS

期刊

Optics Express 封面图
Optics Express
IF:
3.3
论文数:
6.1W
被引数:
14.3W

机构

C
California Institute of Technology
学者数:
2.9W
论文数: 2.5W
被引数: 4.9W
N
national aeronautics & space administration (nasa)
学者数:
3.1W
论文数: 2.6W
被引数: 46
U
University of California Santa Barbara
学者数:
1.2W
论文数: 9.6K
被引数: 3.6W
University of California System 封面图
University of California System
学者数:
37.7W
论文数: 33.8W
被引数: 6.6K
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