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An Efficient Binary Integer Programming Model for Residency Time-Constrained Cluster Tools With Chamber Cleaning Requirements
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DOI：10.1109/TASE.2021.3122576.png)
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摘要
En 中文
Cluster tools play a significant role in the entire process of wafer fabrication. As the width of circuits in semiconductor chips shrinks down to less than 10nm, strict operational constraints are imposed on the operations of cluster tools in order to ensure the quality of processed wafers. Particularly, wafer residency time constraints and chamber cleaning requirements are commonly seen in etching, chemical vapor deposition, coating processes, etc. They make the scheduling problem of cluster tools more challenging. This work aims to provide a solution for dual-arm cluster tools with wafer residency time constraints and chamber cleaning requirements. To do so, it proposes a novel virtual wafer-based scheduling method. By this method, under a steady state, a PM processes either a real or virtual wafer at a time. When a PM processes a virtual one, its chamber can perform a cleaning operation. In this way, we can meet not only the strict residency time constraints for real wafers, but also innovatively meet chamber cleaning requirements. Based on such a novel scheduling method, an efficient binary integer programming model is established to optimize the throughput of cluster tools. Finally, experiments are performed to show the efficiency and effectiveness of the proposed method.
Keyword:
Tools
Robots
Cleaning
Task analysis
Time factors
Schedules
Delays
Chamber cleaning
cluster tools
scheduling
semiconductor manufacturing
wafer fabrication
期刊
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6.4
论文数:
5.1K
被引数:
1.6W
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