.png){kind=icon}
返回
Aperiodic Mo/Si multilayers for hard X-rays
.png){kind=icon}
OA
AI
DOI：10.1364/OE.24.018642.png)
.png){kind=icon}
.png){kind=icon}
分享.png){kind=icon}
收藏
摘要
En 中文
In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6 degrees +/- 0.05 degrees. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard X-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of +/- 0.05 degrees, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard X-ray imaging of highly diverging sources. (C) 2016 Optical Society of America
Keyword:
MO-SI MULTILAYERS
ULTRAVIOLET
MICROSCOPE
DEPOSITION
DESIGN
FILMS
AI总结
对已上传原文的论文进行重点信息的提取，主要内容包括：简要概述、研究摘要、背景介绍、关键亮点、图文解析、展望与总结。
期刊
IF:
3.3
论文数:
6.1W
被引数:
14.3W
机构
引用论文
Demonstration of multilayer reflective optics at photon energies above 0.6 MeV.png)
OPTICS EXPRESSOAAI
OPTICS EXPRESSIF3.3
OAAI分享收藏High versus low reactivity to a novel environment: behavioural, pharmacological and neurochemical assessmentsNeuroscience
NeuroscienceIF0
PREAI
分享收藏
查看更多内容