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Dimension dependence of current injection path in GaInN/GaN multi-quantum-shell (MQS) nanowire-based light-emitting diode arrays
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DOI：10.1515/nanoph-2023-0051.png)
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Abstract
En 中文
To light emitting diodes (LEDs), solving the common non-uniform current injection and efficiency degradation issues in (0001) plane micro-LED is essential. Herein, we investigated the light emission characteristics of various mesa sizes and different p-electrode areas toward the realization of coaxial GaInN/GaN multi-quantum-shell (MQS) nanowires (NWs)-based micro-LEDs. As the mesa area was reduced, the current leakage decreases, and further reduction of the area showed a possibility of realizing micro-LED with less current leakage. The large leakage path is mainly associated with the defective MQS structure on the (0001) plane area of each NW. Therefore, more NWs involved in an LED chip will induce higher reverse leakage. The current density-light output density characteristics showed considerably increased electroluminescence (EL) intensity as the mesa area decreased, owing to the promoted current injection into the efficient NW sidewalls under high current density. The samples with a mesa area of 50 x 50 mu m(2) showed 1.68 times higher light output density than an area of 100 x 100 mu m(2) under a current density of 1000 A/cm(2). In particular, the emission from (1-101) and (10-10) planes did not exhibit an apparent peak shift caused by the quantum-confined Stark effect. Furthermore, by enlarging the p-electrode area, current can be uniformly injected into the entire chip with a trade-off of effective injection to the sidewall of each NW. High performance of the MQS NW-based micro-LED can be expected because of the mitigated efficiency degradation with a reducing mesa area and an optimal dimension of p-electrode.
Keywords:
current injection path
electroluminescence (EL)
ITO area
micro-LED
MQS nanowire
p-electrode area
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