.png){kind=icon}
返回
.png){kind=icon}
.png){kind=icon}
.png){kind=icon}
.png){kind=icon}
.png){kind=icon}
摘要
En 中文
A presentation of etch stop engineering is presented with a review of the present state of the art in etch stop micromachining. This review assumes a global definition for an etch stop and focuses on salient examples of common etch stop techniques, as well as unique and/or novel etch stop methods. A table of representative etch stops is also presented as a summary.
Keyword:
CYCLOTRON-RESONANCE PLASMA
III-V-SEMICONDUCTORS
POROUS SILICON FORMATION
HETEROJUNCTION BIPOLAR-TRANSISTORS
ETHYLENE DIAMINE-PYROCATECHOL
DISSOLUTION SLOWNESS SURFACE
DIAPHRAGM PRESSURE SENSORS
HEAVILY-DOPED SILICON
P-N-JUNCTION
AQUEOUS KOH
AI总结
对已上传原文的论文进行重点信息的提取，主要内容包括：简要概述、研究摘要、背景介绍、关键亮点、图文解析、展望与总结。
