.png){kind=icon}
返回
EUV debris mitigation using magnetic nulls
.png){kind=icon}
OA
AI
DOI：10.1063/5.0152083.png)
.png){kind=icon}
原文求助.png){kind=icon}
分享.png){kind=icon}
收藏
摘要
En 中文
Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin debris on the sensitive collection mirror. Especially difficult to stop are high energy (up to 10 keV) highly charged tin ions created in the plasma. Existing solutions include the use of stopping gas, electric fields, and magnetic fields. One common configuration consists of a magnetic field perpendicular to the EUV emission direction, but such a system can result in ion populations that are trapped rather than removed. We investigate a previously unconsidered mitigation geometry consisting of a magnetic null by performing full-orbit integration of the ion trajectories in an EUV system with realistic dimensions and optimize the coil locations for the null configuration. The magnetic null prevents a fraction of ions from hitting the mirror comparable to that of the perpendicular field, but does not trap any ions due to the chaotic nature of ion trajectories that pass close to the null. This technology can potentially improve LPP-based EUV photolithography system efficiency and lifetime and may allow for a different, more efficient formulation of buffer gas.
Keyword:
GAS
期刊
IF:
3.6
论文数:
10.4W
被引数:
17.8W
机构
引用论文
.png){kind=icon}
Periodic small-signal analysis as a tool to build transient stability models of VSC-based devices
PREAI
分享收藏Artificial intelligence: A new tool in the pathologist's armamentarium for the diagnosis of IBD人工智能: 病理学家军械库中用于诊断IBD的新工具
OAAI
OAAI分享收藏
查看更多内容