返回
From lab to fab: path forward for 2D material electronics
DOI:10.1007/s11432-023-3752-3.png)
摘要
En 中文
The increasing demand for computation requires the development of energy-efficient logic devices with reduced dimensions. Owing to their atomic thickness, 2D semiconductors are expected to provide possible solutions at the sub-1 nm technology node. Furthermore, taking advantage of the van der Waals nature, the low-temperature back-end of line integration with silicon may occur in the near future. In this perspective, vital progress in material synthesis, device engineering, and integration technologies toward integrated circuits based on 2D materials is reviewed. The challenges and important milestones on the roadmap for the next decade toward the fab adoption of 2D materials are outlined. Particularly, performance, power, area, cost, and equipment for further technology development in this area are proposed as key metrics and enablers.
Keyword:
two-dimensional materials
transition-metal dichalcogenides
equipment
integrated circuits
roadmap
期刊
IF:
7.6
论文数:
4.9K
被引数:
8.9K
机构
引用论文
Synthesis of Large-Area MoS2 Atomic Layers with Chemical Vapor Deposition化学气相沉积法合成大面积MoS2原子层
ADVANCED MATERIALS
IF26.8
Towards intrinsic charge transport in monolayer molybdenum disulfide by defect and interface engineering通过缺陷和界面工程研究单层二硫化钼中的本征电荷传输
NATURE COMMUNICATIONS
IF15.7

