.png){kind=icon}
返回
Gradient-Based Source and Mask Optimization in Optical Lithography
.png){kind=icon}
PRE
AI
DOI：10.1109/TIP.2011.2131668.png)
.png){kind=icon}
原文求助.png){kind=icon}
分享.png){kind=icon}
收藏
摘要
En 中文
Source and mask optimization (SMO) has been proposed recently as an effective solution to extend the lifespan of conventional 193 nm lithography, although the process is computationally intensive. In this study, we propose a highly effective and efficient method for source optimization and improve a previous method for mask optimization. An SMO framework is implemented by integrating them. Based on pixel-based source and mask representation, the gradients of the objective function are utilized to guide optimization. In addition to maintain the image fidelity, extra penalties are added into the objective function to increase the depth of focus (DOF) and regularize the source and mask patterns. In our SMO framework, a specially designed mask optimization procedure is performed to enhance the algorithm robustness. Afterward, the source optimization and mask optimization are performed alternatively. Convergence results can be acquired using only two or three iteration cycles. This method is demonstrated using two mask patterns with critical dimensions of 45 nm, including a periodic array of contact holes and a cross gate design. The results show that our method can provide great improvements in both image quality and DOF. The robustness of our method is also verified using different initial conditions.
Keyword:
Depth of focus (DOF)
image fidelity
imaging model
inverse lithography techniques (ILT)
optical lithography
resolution enhancement techniques (RET)
source and mask optimization (SMO)
AI总结
对已上传原文的论文进行重点信息的提取，主要内容包括：简要概述、研究摘要、背景介绍、关键亮点、图文解析、展望与总结。
期刊
IF:
13.7
论文数:
1.0W
被引数:
8.4W
机构
引用论文
From complex structures to complex processes: Percolation theory applied to the formation of a city
PREAI
分享收藏分享收藏Dingoes at the Doorstep: Home Range Sizes and Activity Patterns of Dingoes and Other Wild Dogs around Urban Areas of North-Eastern Australia.png)
Animals
OAAI
AnimalsIF0
OAAI分享收藏Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithographyOPTICS EXPRESS
OAAI
OPTICS EXPRESSIF3.3
OAAI分享收藏
查看更多内容