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High-resolution hard-x-ray microscopy using second-order zone-plate diffraction

delete2011-05-23
delete16
PRE
AI
J
Jaemock Yi *
Y
Yong S. Chu
Y
Yu-Tung Chen
T
Tsung‐Yu Chen
Y
Y. Hwu
G
G. Margaritondo
DOI:10.1088/0022-3727/44/23/232001delete
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摘要

摘要

En 中文
Odd-order diffraction of zone plates (ZPs) is already used for x-ray microscopy but the potential offered by even-order diffraction must still be fully exploited. Width differences between lines and interline spaces transfer intensity from odd-order to even-order diffractions. Here we show that the resulting intense second-order diffraction provides a reasonable tradeoff between spatial resolution and intensity-and constitutes a viable strategy for x-ray microscopy to reach sub-20 nm resolution, in spite of the imperfections of high-aspect-ratio ZPs and of other difficulties.
Keyword:
E-BEAM LITHOGRAPHY
FABRICATION
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期刊

Journal of Physics D-Applied Physics 封面图
Journal of Physics D-Applied Physics
IF:
3.2
论文数:
2.6W
被引数:
4.9W

机构

N
National Tsing Hua University
学者数:
1.6W
论文数: 1.4W
被引数: 1.7W
A
Argonne National Laboratory
学者数:
1.1W
论文数: 9.2K
被引数: 3.8W
U
united states department of energy (doe)
学者数:
11.3W
论文数: 9.6W
被引数: 246
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