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High-resolution hard-x-ray microscopy using second-order zone-plate diffraction
DOI:10.1088/0022-3727/44/23/232001.png)
摘要
En 中文
Odd-order diffraction of zone plates (ZPs) is already used for x-ray microscopy but the potential offered by even-order diffraction must still be fully exploited. Width differences between lines and interline spaces transfer intensity from odd-order to even-order diffractions. Here we show that the resulting intense second-order diffraction provides a reasonable tradeoff between spatial resolution and intensity-and constitutes a viable strategy for x-ray microscopy to reach sub-20 nm resolution, in spite of the imperfections of high-aspect-ratio ZPs and of other difficulties.
Keyword:
E-BEAM LITHOGRAPHY
FABRICATION
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期刊
IF:
3.2
论文数:
2.6W
被引数:
4.9W

