arrow
返回

High-temperature memristors enabled by interfacial engineering

delete2026-03-26
delete0
PRE
AI
J
Jian Zhao
C
Cameron S. Jorgensen
K
K. Mahalingam
C
Cynthia Bowers
W
Wataru Sugimoto
K
Kai Ito
S
Seung Ju Kim
R
Ruoyu Zhao
徐义春 封面图
徐义春 (Yichun Xu)
H
Han-Ting Liao
R
Rajiv K. Kalia
A
Aiichiro Nakano
K
Kohei Shimamura
F
Fuyuki Shimojo
P
Priya Vashishta
A
Ajit K. Roy
N
Ning Ge
M
Miao Hu
R
R. Stanley Williams
Q
Qiangfei Xia
S
Sabyasachi Ganguli
J
J. Joshua Yang *
DOI:10.1126/science.aeb9934delete
delete原文链接
delete原文求助
delete分享
delete收藏
摘要

摘要

En 中文
对能够在极端热环境下工作的电子设备的需求日益增长,涵盖深井钻探、核能、自主系统,甚至金星和 Mercury 表面或近航天器发动机。尽管碳化硅等宽禁带半导体能使晶体管在 800°C 下工作,但 300°C 以上的可靠非易失性存储器仍难以实现。Zhao 等人介绍了可在 700°C 以上工作的忆阻器,具有超过 10^9 次开关周期、超过 50 小时的数据保持能力、ON/OFF 比超过 1000、开关速度低于 30 纳秒以及工作电压低于 1.5 伏的特性。材料表征和建模解释了这种热稳定性。这些结果为极端应用的高温存储器铺平了道路。—Yury Suleymanov
Keyword:
memristors
high-temperature operation
interfacial engineering
nonvolatile memory
wide-band-gap semiconductors

期刊

Science 封面图
Science
IF:
45.8
论文数:
1.4W
被引数:
78.6W

机构

U
university of southern california
学者数:
4.7W
论文数: 3.8W
被引数: 51
T
tetramem
学者数:
3
论文数: 1
被引数: 0
K
kumamoto university
学者数:
1.6K
论文数: 479
被引数: 0
A
airforce research lab
学者数:
5
论文数: 1
被引数: 0
学者 查看更多机构
引用论文

引用论文

Al0.68Sc0.32N/SiC-Based Metal-Ferroelectric-Semiconductor Capacitors Operating up to 1000 °CAl0.68Sc0.32N/SiC基金属-铁电-半导体电容器,工作温度高达1000 °C
err2025-03-17
err0
PREAI
errMoore, David C.; Wang, Yubo; Ware, Spencer; Ma, Sizhe; Pradhan, Dhiren K.; Hu, Zekun; Du, Xingyu; Kennedy, W. Joshua; Glavin, Nicholas R.; Olsson, Roy H.
err分享
err收藏
Activation Energies $(E_{a})$ of Failure Mechanisms in Advanced NAND Flash Cells for Different Generations and Cycling
err2013-03-01
err0
PREAI
errKyunghwan Lee; Myounggon Kang; Seongjun Seo; Duckseoung Kang; Shinhyung Kim; Dong Hua Li; Hyungcheol Shin
err分享
err收藏
Materials for high-temperature digital electronics高温数字电子材料
err2024-10-18
err0
PREAI
errPradhan, Dhiren K.; Moore, David C.; Francis, A. Matt; Kupernik, Jacob; Kennedy, W. Joshua; Glavin, Nicholas R.; Olsson III, Roy H.; Jariwala, Deep
err分享
err收藏
A Monochloro Copper Phthalocyanine Memristor with High-Temperature Resilience for Electronic Synapse Applications用于电子突触应用的具有高温弹性的单氯铜酞菁忆阻器
err2020-12-23
err73
PREAI
errZhou, Jia; Li, Wen; Chen, Ye; Lin, Yen-Hung; Yi, Mingdong; Li, Jiayu; Qian, Yangzhou; Guo, Yun; Cao, Keyang; Xie, Linghai; Ling, Haifeng; Ren, Zhongjie; Xu, Jiangping; Zhu, Jintao; Yan, Shouke; Huang, Wei
err分享
err收藏
Analysis of Failure Mechanisms and Extraction of Activation Energies $(E_{a})$ in 21-nm nand Flash Cells
err2013-01-01
err0
PREAI
errKyunghwan Lee; Myounggon Kang; Seongjun Seo; Dong Hua Li; Jungki Kim; Hyungcheol Shin
err分享
err收藏
High temperature ferroelectric domain wall memory
err2021-03-01
err21
PREAI
errJiang, Jun; Chai, Xiaojie; Wang, Chao; Jiang, Anquan
err分享
err收藏
High-temperature operation of gallium oxide memristors up to 600 K
err2023-01-30
err24
errOAAI
errSato, Kento; Hayashi, Yusuke; Masaoka, Naoki; Tohei, Tetsuya; Sakai, Akira
err分享
err收藏
Endurance/Retention Trade-off on $\hbox{HfO}_{2}/\hbox{Metal}$ Cap 1T1R Bipolar RRAM$ \ hbox{HfO }_{ 2}/\ hbox{Metal}$ Cap 1T1R双极RRAM的耐久性/保持性权衡
err2013-03-01
err0
PREAI
errYang Yin Chen; Ludovic Goux; Sergiu Clima; Bogdan Govoreanu; Robin Degraeve; Gouri Sankar Kar; Andrea Fantini; Guido Groeseneken; Dirk J. Wouters; Malgorzata Jurczak
err分享
err收藏
学者 查看更多内容