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Highly efficient ultra-low blaze angle multilayer grating
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DOI：10.1364/OE.424536.png)
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We have developed an advanced process for blaze angle reduction of x-ray gratings for the soft, tender, and EUV spectral ranges. The process is based on planarization of an anisotropically etched Si blazed grating followed by a chemically selective plasma etch. This provides a way to adjust the blaze angle to any lower value with high accuracy. Here we demonstrate the reduction of the blaze angle to an extremely low value of 0.04 degrees +/- 0.004 degrees. For a 100 lines/mm grating with a Mo/Si multilayer coating, the grating exhibits diffraction efficiency of 58% in the 1st diffraction order at a wavelength of 13.3 nm. This technique will be applicable to a wide range of uses of high efficiency gratings for synchrotron sources, as well as for Free Electron Lasers (FEL). (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
Keyword:
SYNCHROTRON
期刊
IF:
3.3
论文数:
6.1W
被引数:
14.3W
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