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Large-Scale Soft-Lithographic Patterning of Plasmonic Nanoparticles
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DOI：10.1021/acsmaterialslett.0c00535.png)
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Abstract
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Micro- and nanoscale patterned monolayers of plasmonic nanoparticles were fabricated by combining concepts from colloidal chemistry, self-assembly, and subtractive soft lithography. Leveraging chemical interactions between the capping ligands of pre-synthesized gold colloids and a polydimethylsiloxane stamp, we demonstrated patterning gold nanoparticles over centimeter-scale areas with a variety of microand nanoscale geometries, including islands, lines, and chiral structures (e.g., square spirals). By successfully achieving nanoscale manipulation over a wide range of substrates and patterns, we established a powerful and straightforward strategy, nanoparticle chemical lift-off lithography (NP-CLL), for the economical and scalable fabrication of functional plasmonic materials with colloidal nanoparticles as building blocks, offering a transformative solution for designing next-generation plasmonic technologies.
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