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Low-crosstalk silicon photonics arrayed waveguide grating
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DOI：10.3788/COL201715.041301.png)
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摘要
En 中文
In this Letter, we demonstrate a 1 x 4 low-crosstalk silicon photonics cascaded arrayed waveguide grating, which is fabricated on a silicon-on-insulator wafer with a 220-nm-thick top silicon layer and a 2 mu m buried oxide layer. The measured on-chip transmission loss of this cascaded arrayed waveguide grating is similar to 4.0 dB, and the fiber-to-waveguide coupling loss is 1.8 dB/facet. The measured channel spacing is 6.4 nm. The adjacent crosstalk by characterization is very low, only -33.2 dB. Compared to the normal single silicon photonics arrayed waveguide grating with a crosstalk of similar to-12.5 dB, the crosstalk of more than 20 dB is dramatically improved in this cascaded device.
Keyword:
ON-INSULATOR
