返回
Low-loss arrayed waveguide grating at 760 nm
DOI:10.1364/OL.41.001785.png)
摘要
En 中文
An arrayed waveguide grating (AWG) at 760 nm is demonstrated with an insertion loss smaller than 0.5 dB. Interface roughness and waveguide length errors contribute much more to scattering loss and phase errors at 760 nm than at longer wavelengths, thus requiring improved design and fabrication. This Letter details how this is achieved by minimizing interfacial scattering, grating side-order excitation, and phase errors in the AWG. With silicon nitride core and silicon dioxide clad waveguides on silicon, this AWG is compatible with heterogeneously integrated lasers for on-chip spectral beam combining. (C) 2016 Optical Society of America
Keyword:
SI3N4
DESIGN
PERFORMANCE
DEVICES
AI总结
对已上传原文的论文进行重点信息的提取,主要内容包括:简要概述、研究摘要、背景介绍、关键亮点、图文解析、展望与总结。
期刊
IF:
3.3
论文数:
4.0W
被引数:
7.6W
机构
引用论文
Design trade-offs for silicon-on-insulator-based AWGs for (de)multiplexer applications用于 (解) 复用器应用的基于绝缘体上硅的awg的设计权衡
OPTICS LETTERS
IF3.3
The role of photomask resolution on the performance of arrayed-waveguide grating devices光掩模分辨率对阵列波导光栅器件性能的影响
Structure et ontogenèse du thalle squamuleux du lichen Endocarpon pusillum (Pyrénolichens, Verrucariacées)地衣Endocarpon pusillum(角苔纲,疣衣科)鳞片状营养体的结构和个体发育
Planar waveguides with less than 0.1 dB/m propagation loss fabricated with wafer bonding通过晶片键合制造的传播损耗小于0.1 dB/m的平面波导
OPTICS EXPRESS
IF3.3

