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Low-loss arrayed waveguide grating at 760 nm

delete2016-04-11
delete35
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OA
AI
E
Eric J. Stanton *
A
Alexander Spott
M
Michael L. Davenport
N
Nicolas Volet
J
John E. Bowers
DOI:10.1364/OL.41.001785delete
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摘要

摘要

En 中文
An arrayed waveguide grating (AWG) at 760 nm is demonstrated with an insertion loss smaller than 0.5 dB. Interface roughness and waveguide length errors contribute much more to scattering loss and phase errors at 760 nm than at longer wavelengths, thus requiring improved design and fabrication. This Letter details how this is achieved by minimizing interfacial scattering, grating side-order excitation, and phase errors in the AWG. With silicon nitride core and silicon dioxide clad waveguides on silicon, this AWG is compatible with heterogeneously integrated lasers for on-chip spectral beam combining. (C) 2016 Optical Society of America
Keyword:
SI3N4
DESIGN
PERFORMANCE
DEVICES
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期刊

Optics Letters 封面图
Optics Letters
IF:
3.3
论文数:
4.0W
被引数:
7.6W

机构

University of California System 封面图
University of California System
学者数:
37.7W
论文数: 33.8W
被引数: 6.6K
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