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Low-Temperature Chemical Bath Deposition of MoO3 Thin Films: Structural and Electrochemical Evaluation
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DOI：10.1016/j.ceramint.2026.08.130.png)
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Abstract
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Using a standard chemical bath deposition (CBD) technique, molybdenum trioxide (MoO3) thin films were deposited on nickel (Ni) foil, stainless steel (SS) foil, and Ni foam substrates. The impact of the deposition temperature (60°C – 100°C) on their morphological, structural, and electrochemical characteristics was examined. At higher temperatures, orthorhombic α-MoO3 with improved crystallinity was established by X-ray diffraction, and the presence of a distinctive Mo–O–Mo stretching mode of orthorhombic MoO3 was confirmed by Fourier transform infrared spectroscopy. Morphological analysis revealed that the film deposited at 80 °C exhibits a highly porous and interconnected nanostructure. Electrochemical measurements performed in 3 M KOH electrolyte demonstrated pronounced pseudocapacitive behaviour with well-defined redox activity. Notably, the MoO3 electrode deposited on Ni foam at 80°C demonstrated superior electrochemical performance, delivering enhanced current response, a larger CV enclosed area, and a longer discharge time in GCD measurements and a calculated specific capacitance of 500 F g-1 at 0.75 A g-1. This work's novelty is demonstrated in the combined substrate-dependent and temperature-controlled CBD approach, identifying 80°C as the optimal condition for achieving binder-free, porous MoO3 thin films with enhanced electrochemical performance for supercapacitor applications. It exhibits ∼83% capacitance retention after 5000 cycles, indicating the potential for energy storage applications.
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