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Manufacturability-oriented early lithography hotspot detection via an attention-enhanced hybrid network

delete2026-08-10
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PRE
AI
H
Hui Xu
王文君 (Wenjun Wang) *
X
Xia Sun
C
Chenlong Zhou
G
Guoshuai Wang
Y
Yunhong Huo
R
Ruijun Ma
Z
Zhengfeng Huang
DOI:10.1016/j.measurement.2026.122805delete
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Abstract

Abstract

En 中文
• Formulate hotspot screening as design-stage virtual metrology. • Define a dimensionless manufacturability-risk indicator and its metrological role. • Embed layout and lithography priors into a virtual metrology function. • Characterize prediction-level uncertainty via repeated-run confidence intervals. • Show favorable Recall-FA/FAR trade-offs on ICCAD-2012 and ICCAD-2019.
Keywords:
Lithography hotspot detection
Virtual metrology
Manufacturability assessment
Multi-scale feature fusion
Attention mechanism

Journal

Measurement cover
Measurement
IF:
5.6
Papers:
1.9W
Citations:
5.4W

Organization

A
anhui university of science and technology
Scholars:
1.2K
Papers: 446
Citations: 0
H
Hefei University of Technology
Scholars:
4.7K
Papers: 1.6K
Citations: 2.1W
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