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MTMO grayscale photomask
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DOI：10.1364/OE.18.002621.png)
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We present a new class of simple, cheap and stable grayscale photomasks based on the metal-transparent-metallic-oxides (MTMO) systems by laser direct writing in metal films. For obtaining high resolution and grainless grayscale patterns we developed a refinement method of the films, in which the nanometer size effect may play a significant role for the improvement. We propose a layered oxidation model and a grain model for the mechanism of In-and Sn-based MTMO systems. The masks have a wide application wavelength range at least from 350 to 700 nm. Three-dimensional microstructures have been successfully fabricated by using the MTMO grayscale masks. (C) 2010 Optical Society of America
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IF:
3.3
论文数:
6.1W
被引数:
14.3W
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