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Multi foci with diffraction limited resolution
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DOI：10.1364/OE.21.021708.png)
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Abstract
En 中文
The generation of multi foci is an established method for high-speed parallel direct laser writing, scanning microscopy and for optical tweezer arrays. However, the quality of multi foci reduces with increasing resolution due to interference effects. Here, we report on a spatial-light-modulator-based method that allows for highly uniform, close to Gaussian spots with diffraction limited resolution using a wavelength of 780 nm. We introduce modifications of a standard algorithm that calculates a field distribution on the entrance pupil of a high numerical aperture objective splitting the focal volume into a multitude of spots. Our modified algorithm compares favourably to a commonly used algorithm in full vectorial calculations as well as in point-spread-function measurements. The lateral and axial resolution limits of spots generated by the new algorithm are found to be close to the diffraction limit. (C) 2013 Optical Society of America
Keywords:
2-PHOTON POLYMERIZATION
LIGHT
FABRICATION
ABERRATION
ARRAY
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