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Multi-spectral snapshot diffraction-based overlay metrology
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DOI：10.1364/OL.495113.png)
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Diffraction-based overlay (DBO) metrology has been suc-cessfully introduced to deal with the tighter overlay control in modern semiconductor manufacturing. Moreover, DBO metrology typically needs to be performed at multiple wave-lengths to achieve accurate and robust measurement in the presence of overlay target deformations. In this Let-ter, we outline a proposal for multi-spectral DBO metrology based on the linear relation between the overlay errors and the combinations of off-diagonal-block Mueller matrix ele-ments increment M =Mij - ( - 1)jMji (i =1, 2; j = 3, 4) associated with the zeroth-order diffraction of overlay target gratings. We propose an approach that can realize snapshot and direct measurement of increment M over a broad spectral range without any rotating or active polarization component. The simu-lation results demonstrate the capability of the proposed method for multi-spectral overlay metrology in a single shot. & COPY; 2023 Optica Publishing Group
Keyword:
MUELLER MATRIX
POLARIMETRY
期刊
IF:
3.3
论文数:
4.0W
被引数:
7.6W
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