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Multilayer deformation planarization by substrate pit suturing
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DOI：10.1364/OL.41.003403.png)
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In the pursuit of 1064 nm high-power laser resistance dielectric coatings in the nanosecond region, a group of HfO2/SiO2 high reflectors with and without suture layers were prepared on prearranged fused silica substrates with femtosecond laser pits. Surface morphology, global coating stress, and high-resolution cross sections were characterized to determine the effects of substrate pit suturing. Laser-induced damage resistance was investigated for samples with and without suture layers. Our results indicate considerable stability in terms of the nanosecond 1064 nm laser-induced damage threshold for samples having a suture layer, due to decreased electronic field (e-field) deformation with simultaneous elimination of internal cracks. In addition, a suture layer formed by plasma ion-assisted deposition could effectively improve global mechanical stress of the coatings. By effectively reducing the multilayer deformation using a suture layer, electron-beam high-reflective coatings, whose laser-induced damage resistance was not influenced by the substrate pit, can be prepared. (C) 2016 Optical Society of America
Keyword:
LASER-INDUCED DAMAGE
HIGH-REFLECTIVE COATINGS
NODULAR DEFECTS
NM
INTENSIFICATION
RESISTANCE
IGNITION
MIRRORS
SIZE
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3.3
论文数:
4.0W
被引数:
7.6W
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