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Nanometer patterning with ice
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DOI：10.1021/nl050405n.png)
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摘要
En 中文
Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.
Keyword:
ELECTRON-BEAM LITHOGRAPHY
FABRICATION
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期刊
IF:
9.1
论文数:
2.7W
被引数:
16.5W
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