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Ordered chlorinated monolayer silicene structures
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DOI：10.1103/PhysRevB.93.155410.png)
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We report on a systematic experimental study on the chlorination of monatomic silicene layer on Ag(111) by scanning tunneling microscopy. Monolayer silicene on Ag(111) can form 4x4, (root 13 x root 13)R +/- 13.9 degrees, and (2 root 3x2 root 3)R30 degrees reconstructions due to their different buckling configurations. We found that at low dosage, Cl atoms attach to the upper buckled Si atoms without changing the buckling configuration of the silicene monolayer. However, at high coverage, the global buckling configuration will be significantly changed, resulting in new ordered structures. Interestingly, all monolayer silicene structures, regardless of their initial reconstructions, tend to form a local silicene 1x1 structure at the saturation coverage. The mechanism for chlorination of monolayer silicene is explained.
Keyword:
ELECTRONIC-PROPERTIES
SURFACE
GERMANENE
ADSORPTION
AG(111)
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期刊
IF:
3.7
论文数:
15.4W
被引数:
41.0W
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