Quantum dot patterning by direct photolithography

Junpeng Fan

doi:10.1038/s41565-022-01187-0

2022-08-11

PRE

Junpeng Fan

Lei Qian *

DOI：10.1038/s41565-022-01187-0

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摘要

En 中文

A 'dual-ligand passivation system' is designed and synthesized to functionalize colloidal quantum dots to realize ultra-high resolution patterns by direct photolithography.

期刊

Nature Nanotechnology

IF:

34.9

论文数:

4.8K

被引数:

8.1W

机构

chinese academy of sciences

学者数:

56.7W

论文数: 45.0W

被引数: 704

引用论文

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