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Soft magnetic properties of (Ni50Fe50) SiO2 granular thin films for high frequency application
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DOI：10.1016/S1001-0521(07)60166-1.png)
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Abstract
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A series of (Ni50Fe50)(x)(SiO2)((1-x)) films with different volume fraction x was fabricated by magnetron co-sputtering technique. The microstructure, magnetic and electrical properties were investigated systematically by using X-ray diffraction, transmission electronic microscope, vibrating sample magnetometer and the traditional four point measurement method of resistivity. The results show that the samples consist of nano-scaled Ni50Fe50 metallic particles with fcc structure uniformly embedded in amorphous insulating SiO2 matrix, and the particle size decreases with the decrease of x. The rapid change of coercivity with x is observed, and a minimum value 160 A center dot m(-1) of H-c was obtained for the sample of x = 0.83 with film thickness of 180 nm, which can be contributed to the exchange coupling between nano-scaled Ni50Fe50 particles. At the frequency lower than 1 GHz, the real part mu' of complex permeability keeps about 110 and the image part mu is less than 15. Besides, this film exhibits high resistivity rho = 263 mu Omega center dot cm, high saturation magnetization 4 pi M-s = 1.25 T, high in-plane magnetic anisotropy field H-k = 6.37 kA center dot m(-1), and the ferromagnetic resonance (FMR) frequency is estimated to be 2.8 GHz. Therefore, this film can be used in high frequency devices operating over 2 GHz.
Keywords:
thin films
nanostructure
magnetic properties
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