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Tailoring properties of ZnO through amorphous Al2O3 interleave design
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DOI：10.1016/j.optmat.2026.118267.png)
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Abstract
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• Zn–Al–O interfacial regions drive structural and electronic evolution. • Optical bandgap and refractive index are modulated by Al2O3 interleave density. • Semiconductor-to-insulator transition emerges from ZnO-rich to Al2O3-rich regimes. • Strong defect-related emission in the visible arises in the Al2O3-rich regime. • ZnO–Al2O3 interlayers enable coatings for solar cells and optoelectronics.
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