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Thin-Film Ferroelectrics

delete2022-06-10
delete64
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OA
AI
A
Abel Fernández
M
Megha Acharya
H
Han‐Gyeol Lee
J
Jesse Schimpf
Y
Yizhe Jiang
D
Djamila Lou
Z
Zishen Tian
L
Lane W. Martin *
DOI：10.1002/adma.202108841delete
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摘要

摘要

En 中文
在过去的30年中，基于外延薄膜的研究的实施彻底改变了铁电氧化物的研究，这推动了对铁电物理学的理解以及对新型极性结构和功能的实现的许多进步。新问题推动了外延薄膜的高级合成，表征和模拟的发展，进而在微观，中观和宏观长度尺度上提供了新的见解和应用。本文回顾了铁电薄膜研究的发展历程，从早期开始，人们对尺寸和应变对铁电体的作用的理解发展到今天，这种理解被用来创建复杂的分层畴结构，新颖的极性拓扑结构以及受控的化学和缺陷轮廓。外延技术的扩展，再加上高通量模拟的进步，现在将加速新铁电材料的发现和研究。与这些新材料齐头并进的是对铁电功能的新理解和控制。今天，研究人员正在积极努力将这些经验应用于许多应用中，包括新颖的存储器和逻辑架构，以及大量的能量转换设备。
Keyword:
epitaxy
ferroelectrics
piezoelectrics
pyroelectrics
thin films

期刊

Advanced Materials 封面图
Advanced Materials
IF:
26.8
论文数:
3.4W
被引数:
46.0W

机构

University of California System 封面图
University of California System
学者数:
37.7W
论文数: 33.8W
被引数: 6.6K
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