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TITANIUM CLUSTER POLYMERS AS REACTIVE ION ETCH BARRIERS
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DOI：10.1021/cm00056a020.png)
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摘要
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Titanium oxide films are barriers to the reactive oxygen etching of photoresists in silicon device fabrication. Medium-sized clusters of Ti oxide-alkoxide have been isolated by Klemperer et al. as intermediates in the formation of sol-gels from Ti tetraalkoxides and water. We report that one of the clusters, Ti11O13 (OiPr)(18), reads with diols in hydrocarbon solvents to form network cluster polymers. These polymers form thin films of Ti-rich material that can be pyrolyzed to the anatase form of TiO2. Chemisorption of these cluster polymers onto the surfaces of poly(vinylbenzylphosphonic acid) copolymers (Macromolecules 1995, 28, 110) gives thin coatings with significant etch resistance. A sequence of three depositions is sufficient to create an etch mask with 300:1 selectivity vs the untreated copolymers. Prospects for using this chemistry in microlithographic patterning via surface imaging will be discussed.
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