Two-dimensional hard masks push three-dimensional patterning

doi:10.1038/s41563-026-02571-0

2026-04-16

PRE

Jihoon Chang

Chul‐Ho Lee *

DOI：10.1038/s41563-026-02571-0

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摘要

En 中文

超薄范德华金属氧卤化物作为三维半导体加工中的高稳定性硬掩模。其优异的等离子体抗性和独特的等离子体诱导平滑性能实现了高深宽比刻蚀和各种材料的精确纳米图案化。

Keyword:

Electronic devices

Two-dimensional materials

Materials Science

general

Optical and Electronic Materials

Biomaterials

Nanotechnology

Condensed Matter Physics

期刊

Nature Materials

IF:

38.5

论文数:

6.8K

被引数:

11.5W

机构

seoul national university

学者数:

6.5K

论文数: 2.4K

被引数: 0

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