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Work Function Engineering of Thin α-RuCl3 by Argon Sputtering
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DOI：10.1002/admi.202200754.png)
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alpha-RuCl3 is a candidate material for the realization of a Kitaev spin liquid with envisioned applications for quantum computing. It is a van-der-Waals material with in-plane honeycomb lattice equivalent to the CrX3 (X= Cl, Br, I) type 2D magnets. Here, possibilities of defect engineering and surface modification of thin crystals are explored by Ar+ dosing and vacuum annealing. Chlorine is easily removed from the surface, which reduces the Ru valence and eventually leaves a Ru rich surface layer behind. A peculiar thickness dependence of the work function emerges after Ar+ sputtering, which is ascribed to the remaining chlorine concentration. This work elucidates material properties of thin alpha-RuCl3 and introduces concepts of property engineering to create homojunctions and control level alignment by standard in situ methods.
Keyword:
alpha-RuCl3
2D materials
photoemission spectroscopy
期刊
IF:
4.4
论文数:
6.7K
被引数:
2.4W
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