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A Design-Technology Co-Optimization Framework Based on Process-Parameter Sensitivity Analysis
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DOI：10.3390/electronics15163553.png)
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Abstract
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This paper proposes a design-technology co-optimization (DTCO) framework applicable to advanced technology nodes, which accelerates the process optimization exploration for such nodes. Developing automatic parameter extraction algorithms tailored for the BSIM-CMG model, along with predictive neural networks, substantially reduces the DTCO workflow cycle time. Data-driven sensitivity analysis of critical electrical parameters to process variations provides an optimization exploration path, guiding the optimization of process parameters. Taking the optimization of a 13-stage ring oscillator circuit at the 14 nm node as a case, the DTCO framework is employed to formulate Hfin process conditions for the respective requirements of minimum power consumption and maximum performance. The framework features good transferability and can be extended to the design-technology co-development of other advanced nodes and emerging device architectures.
Keywords:
DTCO
TCAD
FinFET
compact-model parameter extraction
PPA
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2.6
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