A plasma-treated chalcogenide switch device for stackable scalable 3D nanoscale memory

doi:10.1038/ncomms3629

A plasma-treated chalcogenide switch device for stackable scalable 3D nanoscale memory

2013-10-16

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DOI：10.1038/ncomms3629

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Stackable select devices such as the oxide p-n junction diode and the Schottky diode (one-way switch) have been proposed for non-volatile unipolar resistive switching devices; however, bidirectional select devices (or two-way switch) need to be developed for bipolar resistive switching devices. Here we report on a fully stackable switching device that solves several problems including current density, temperature stability, cycling endurance and cycle distribution. We demonstrate that the threshold switching device based on As-Ge-Te-Si material significantly improves cycling endurance performance by reactive nitrogen deposition and nitrogen plasma hardening. Formation of the thin Si3N4 glass layer by the plasma treatment retards tellurium diffusion during cycling. Scalability of threshold switching devices is measured down to 30 nm scale with extremely fast switching speed of similar to 2 ns.

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A plasma-treated chalcogenide switch device for stackable scalable 3D nanoscale memory

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