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A versatile digitally-graded buffer structure for metamorphic device applications
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DOI：10.1088/1361-6463/aab310.png)
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Abstract
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Exploring more effective buffer schemes for mitigating dislocation deficiencies is the key technology towards higher performance metamorphic devices. Here we demonstrate a versatile metamorphic grading structure consisting of 38-period alternated multilayers of In0.52Al0.48As and In0.82Al0.18As on InP substrate, thicknesses of which in each period were gradually varied in opposite directions from 48.7 and 1.3 nm to 1.3 and 48.7 nm, respectively, akin to a digital alloy. Both preferentially dislocation nucleation and blocking of threading dislocation transmission are observed near the In0.82Al0.18As/In0.52Al0.48As interfaces, which help relax the strain and lower the residual defect density. A 2.6 mu m In0.83Ga0.17As pin photodetector is fabricated on this pseudo-substrate, attaining a low dark current density of 2.9 x 10(-6) A cm(-2) and a high detectivity of 1.8 x 10(10) cmHz(1/2)W(-1) at room temperature, comparable with the states of the art that on linearly-graded buffer layers. These results indicate such digitallygraded buffer structures are promising for enhancing performances of metamorphic devices, and can be easily generalized to other lattice-mismatched material systems.
Keywords:
digital
interfaces
grading
metamorphic
optoelectronic
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