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Atomic-scale removal mechanism for cobalt in electrochemical mechanical polishing

delete2026-07-28
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PRE
AI
F
Fangjin Xie
W
Wenhu Xu
M
Meirong Yi
J
Jianfeng Chen
X
Xiaobing Li
M
Min Zhong *
DOI：10.1016/j.triboint.2026.112528delete
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Abstract

Abstract

En 中文
• Revealing an electric-field governed atomic-scale stripping mechanism of Co. • Establishing correlation between reaction layer dynamics and interfacial mechanics. • Controllable transition between active removal and passivated surface regimes. • Mechanistic guidance for high-efficiency, low-damage electrochemical polishing.

Journal

Tribology International cover
Tribology International
IF:
6.9
Papers:
1.1W
Citations:
4.2W

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