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Benchmarking atomically defined AFM tips for chemical-selective imaging

delete2021-01-01
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OA
AI
B
Bertram Schulze Lammers
D
Damla Yesilpinar
A
Alexander Timmer
胡智鑫 cover
胡智鑫 (Zhixin Hu) *
季威 cover
季威 (Wei Ji)
S
Saeed Amirjalayer
H
Harald Fuchs
H
Harry Mönig *
DOI:10.1039/d1nr04080ddelete
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Abstract

Abstract

En 中文
Controlling the identity of the tip-terminating atom or molecule in low-temperature atomic force microscopy has led to ground breaking progress in surface chemistry and nanotechnology. Lacking a comparative tip-performance assessment, a profound standardization in such experiments is highly desirable. Here we directly compare the imaging and force-spectroscopy capabilities of four atomically defined tips, namely Cu-, Xe-, CO-, and O-terminated Cu-tips (CuOx-tips). Using a nanostructured copper-oxide surface as benchmark system, we found that Cu-tips react with surface oxygen, while chemically inert Xe- and CO-tips allow entering the repulsive force regime enabling increased resolution. However, their high flexibility leads to imaging artifacts and their strong passivation suppresses the chemical contrast. The higher rigidity and selectively increased chemical reactivity of CuOx-tips prevent tip-bending artifacts and generate a distinct chemical contrast. This result is particularly promising in view of future studies on other metal-oxide surfaces.
Keywords:
FORCE MICROSCOPY
SINGLE-MOLECULE
ADSORPTION
CONTRAST
IMAGES
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Journal

Nanoscale cover
Nanoscale
IF:
5.1
Papers:
3.0W
Citations:
11.6W

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T
tianjin university
Scholars:
8.0W
Papers: 5.7W
Citations: 88
R
Renmin University of China
Scholars:
8.1K
Papers: 7.7K
Citations: 1.1W
U
university of munster
Scholars:
2.8W
Papers: 2.2W
Citations: 45
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