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Characterizing Patterned Block Copolymer Thin Films with Soft X-rays

delete2017-06-06
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PRE
AI
D
Daniel F. Sunday *
J
Jiaxing Ren
C
Christopher D. Liman
L
Lance Williamson
R
Roel Gronheid
P
Paul F. Nealey
R
R. Joseph Kline
DOI:10.1021/acsami.7b02791delete
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Abstract

Abstract

En 中文
The directed self-assembly (DSA) of block copolymers (BCPs) is a potential solution for patterning critical features for integrated circuits at future technology nodes. For this process to be implemented, there needs to be a better understanding of how the template guides the assembly and induces subsurface changes in the lamellar structure. Using a rotational transmission X-ray scattering measurement coupled with soft X-rays to improve contrast between polymer components, the impact of the ratio of the guiding stripe width (W) to the BCP pitch (L-0) was investigated. For W/L-0 < 1, continuous vertical lamella were observed, with some fluctuations in the interface profile near the template that smoothed out further up the structure. Near W/L-0 approximate to 1.5, the arrangement of the lamella shifted, moving from polystyrene centered on the guiding stripe to poly(methyl methacrylate) centered on the guiding stripe.
Keywords:
directed self-assembly
small-angle X-ray scattering block copolymers
soft X-ray
inverse problem
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Journal

ACS Applied Materials and Interfaces cover
ACS Applied Materials and Interfaces
IF:
8.2
Papers:
6.1W
Citations:
38.7W

Organization

U
university of chicago
Scholars:
4.5W
Papers: 3.7W
Citations: 80
I
interuniversity microelectronics centre
Scholars:
6.3K
Papers: 4.0K
Citations: 0
N
national institute of standards & technology (nist) - usa
Scholars:
9.7K
Papers: 9.0K
Citations: 4
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