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Concurrent control chart pattern recognition in manufacturing processes based on zero-shot learning

delete2024-11-01
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PRE
AI
Y
Yazhou Li
戴
戴伟 (Wei Dai) *
余爽 cover
余爽 (Shuang Yu)
何
何益海 (Yihai He)
DOI:10.1016/j.isatra.2024.09.001delete
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Abstract

Abstract

En 中文
In real industrial settings, collecting and labeling concurrent abnormal control chart pattern (CCP) samples are challenging, thereby hindering the effectiveness of current CCP recognition (CCPR) methods. This paper introduces zero-shot learning into quality control, proposing an intelligent model for recognizing zero-shot concurrent CCPs (C-CCPs). A multiscale ordinal pattern (OP) feature considering data sequential relationship is proposed. Drawing from expert knowledge, an attribute description space (ADS) is established to infer from single CCPs to C-CCPs. An ADS is embedded between features and labels, and the attribute classifier associates the features and attributes of CCPs. Experimental results demonstrate an accuracy of 98.73 % for 11 unseen CCCPs and an overall accuracy of 98.89 % for all 19 CCPs, without C-CCP samples in training. Compared with other features, the multiscale OP feature has the best recognition effect on unseen C-CCPs.
Keywords:
Control chart pattern recognition
Concurrent CCP
Zero-shot learning
Generalized ZSL
Ordinal patterns

Journal

ISA Transactions cover
ISA Transactions
IF:
6.5
Papers:
6.1K
Citations:
2.0W

Organization

B
Beihang University
Scholars:
5.2W
Papers: 4.1W
Citations: 37
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