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Cover Image, Volume 8, Number 7, July 2026
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DOI：10.1002/cey2.70341.png)
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Abstract
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Front cover image: Precise control of amorphous carbon surfaces is essential for advanced energy devices and semiconductor fabrication, yet conventional oxidants often induce non-selective damage. In article number CEY270120, Lee et al. report a protonmediated oxidation strategy using Keggin-type aluminum polyoxometalate (Al-POM) clusters supported on silica nanoparticles. The positively charged Al-POM species selectively localize on sp2-rich domains and release protons that promote oxygen functionalization while preserving the underlying carbon framework. The resulting surface-engineered carbon exhibits improved wettability and interfacial characteristics, enabling more reliable performance in next-generation energy devices and semiconductor manufacturing processing.
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