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Diamond-like Carbon Patterning by the Submerged Discharge Plasma Technique via Soft Solution Processing
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DOI：10.1021/acsomega.3c01322.png)
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Abstract
En 中文
Submerged plasma-assisted discharge direct patterning of diamond-like carbon (DLC) onto the silicon substrate in ambient conditions has succeeded as a new and novel soft solution process. In this environmentally benign technique, a copious amount of pure ethanol (ca. 4 mL) was locally activated with a maximum of ca. 0.23 mkWh by an aselectrochemically synthesized ultrasharp tungsten tip. With the assisted submerged plasma, the decomposed ethanol molecules are anodically patterned directly onto the silicon substrate in ambient conditions. The physical nature of DLC patterns was accessed by profilometry, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy analysis. Furthermore, Fourier-transform infrared, Raman, and X-ray photoelectron spectra were analyzed for chemical compositions and structures, such as surface functionalization, carbon-carbon bonding, and sp2-sp3 ratio, respectively. From a Berkovich-configured nanoindentation analysis, Young's modulus and hardness have shown increasing trend with increasing sp3-sp2 ratio in DLC patterns of 68.5 and 2.8 GPa, respectively. From the electrochemical cyclovoltammetry analysis, a maximum areal specific capacitance of 205.5 mu F/cm2 has been achieved at a scan rate of 5 mV/s. The one-step, green, and environmentally sustainable approach of rapid formation of DLC patterns is thus a promising technique for various carbon-based electrode fabrication processes.
Keywords:
CONDUCTIVE GLASS
THIN-FILMS
DLC FILMS
ELECTRODEPOSITION
DEPOSITION
SUBSTRATE
ELECTROLYSIS
REDUCTION
MECHANISM
OXIDATION
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