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Eight-wave mixing parametrical amplification
DOI:10.1364/OE.25.025212.png)
Abstract
En 中文
We investigate parametrically amplified eight-wave mixing (PA-EWM). The double dressed PA-four-wave mixing (PA-FWM) is the superposition of one PA-FWM process, two different PA-six-wave mixing (PA-SWM) processes (PA-SWM1 and PA-SWM2 with external dressing field 776nm and 795nm, respectively) and one PA-EWM process. When the phases among FWM, SWM1, SWM2 and EWM change from 0 to pi, the double dressed PA-FWM could gradually satisfy the pure enhancement (all 0), partial enhancement and suppression (mixture of 0 and pi), or pure suppression condition (all pi). The outcomes of the investigation can potentially contribute to the development of multi-channel quantum information processing and high dimensional stereoscopic imaging. (C) 2017 Optical Society of America
Keywords:
QUANTUM
GENERATION
OPTICS
VAPOR
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