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Electric-field engineering and SISSO prediction of Schottky barrier heights

delete2026-04-30
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PRE
AI
Q
Qian Chen
C
Chenghua Sun
X
Xinjie Wang
L
Lixuan Wang
Q
Qingguo Xu *
R
Rui Zhang *
J
Jisong Hu *
G
Guoqiang Hao *
DOI:10.1016/j.commatsci.2026.114743delete
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Abstract

Abstract

En 中文
• Electric field effectively modulates Schottky barrier height in C-MX2. • A symbolic regression (SISSO) approach identifies a key SBH descriptor. • The descriptor integrates electric field, lattice constant, and atomic radius. • The model exhibits high accuracy and transferability to telluride systems. • Fermi-level pinning factor confirms the tunability of graphene work function.
Keywords:
Schottky barrier height
electric field
SISSO
Fermi-level pinning
graphene work function

Journal

Computational Materials Science cover
Computational Materials Science
IF:
3.3
Papers:
1.3W
Citations:
3.6W

Organization

S
shanghai solar energy research center co., ltd
Scholars:
1
Papers: 1
Citations: 0
H
Hanshan Normal University
Scholars:
825
Papers: 571
Citations: 593
E
east china university of science and technology
Scholars:
7.3K
Papers: 2.4K
Citations: 3
S
swinburne university of technology
Scholars:
719
Papers: 401
Citations: 0
S
Shanghai Institute of Technology
Scholars:
1.1K
Papers: 381
Citations: 5.1K
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