.png){kind=icon}
.png){kind=icon}
Return
Error correction method for enhanced focus detection accuracy in high-resolution lithography
.png){kind=icon}
PRE
AI
DOI：10.1117/12.3091677.png)
.png){kind=icon}
Original request for help.png){kind=icon}
Share.png){kind=icon}
Save
Abstract
En 中文
Improving focus detection accuracy is crucial for enhancing the resolution of lithography systems. In conventional light-intensity-based setups, the hysteresis nonlinearity of photoelastic modulators (PEMs) and thermally induced phase drift in waveplates severely compromise measurement accuracy, limiting their applicability in high-resolution lithography. To mitigate these limitations, this work establishes a phase error compensation framework featuring PEM dynamic linearization and waveplate temperature co-calibration. First, a simplified compensation model is developed to mitigate PEM hysteresis by dynamically adjusting the phase delay based on the driving voltage slew rate. Second, the delay phase of the waveplate is obtained by calibrating the temperature drift coefficient and enhanced through a secondary temperature compensation strategy. Simulation results under lithography conditions show that phase delay fluctuations in the PEM and phase shifts in the waveplate are significantly reduced, thereby improving focus detection accuracy to approximately three times the original level. This hardware-compatible approach fulfills the demands of high-resolution lithography and offers a practical solution for precise focus detection.
Keywords:
High-resolution lithography
Focus detection
Error correction
Journal
1
IF:
0
Papers:
110
Citations:
0