Fabrication-tolerant inverse-designed mode multiplexers on X-cut thin-film lithium niobate

Siyuan Zhou

doi:10.1016/j.optlastec.2026.116105

Fabrication-tolerant inverse-designed mode multiplexers on X-cut thin-film lithium niobate

2026-08-08

0

PRE

AI

S

Siyuan Zhou

W

Wenqu Su

C

Chunde Li

Y

Yushan Liu

G

Guanyu Chen *

H

Hua Yu *

DOI：10.1016/j.optlastec.2026.116105

Original

Original request for help

Save

Abstract

En 中文

• Ultracompact, fabrication-tolerant two-channel mode MUX on X-cut TFLN. • MFS-constrained topological inverse design enabling manufacturable device features. • Anisotropic re-evaluation revealing scalability limits of four-channel mode MUXs. • Five-channel wavelength deMUX demonstrating hybrid mode- and wavelength-division multiplexing.

Keywords:

Integrated optics

X-cut thin-film lithium niobate

Inverse design

Mode multiplexer

Wavelength demultiplexer

Fabrication-tolerant inverse-designed mode multiplexers on X-cut thin-film lithium niobate

Abstract

Journal

Organization

Cited Papers

Citing Papers