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Far-field interference nano-lithography for creating arbitrary sub-diffraction patterns
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DOI：10.1016/j.optlastec.2025.114168.png)
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Abstract
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The growing demand for fabricating arbitrary nanoscale patterns—both periodic and aperiodic—necessitates new lithography techniques capable of overcoming the diffraction limit. In this paper, we propose a theoretical multi-exposure far-field interference lithography method that enables the formation of sub-diffraction patterns without requiring masks with sub-wavelength features or near-field configurations. The method works by decomposing the spatial frequency spectrum of the desired pattern into multiple bands, each implemented using a distinct mask and a corresponding evanescent reference wave. This approach effectively shifts and reconstructs high spatial frequency components on the photoresist surface through wave interference. Simulation results demonstrate that increasing the number of exposures enables the creation of finer features while relaxing fabrication constraints such as high numerical aperture and complex mask design. Our method offers a scalable and flexible solution for high-resolution nanofabrication in both research and industrial applications.
Keywords:
Interference lithography
Sub-diffraction patterns
Fourier optics
Nano-lithography
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