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Femtosecond laser ablation of CaF2: Plasma characterization and thin films deposition
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DOI：10.1016/j.apsusc.2013.09.089.png)
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Abstract
En 中文
Nanostructured thin films of CaF2 have been deposited in vacuum by ultra-short pulse laser ablation. The laser-induced plasma, characterized by optical emission spectroscopy and ICCD fast imaging, shows the presence of Ca and F atomic species, neutral and ionized, together with the CaF molecular species. Although continuous blackbody-like emission has not been detected from the plasma, the deposited films, characterized by Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy, are apparently formed by the coalescence of a large number of nanoparticles composed by stoichiometric CaF2. (C) 2013 Elsevier B.V. All rights reserved.
Keywords:
Calcium fluoride
Ultra-short pulse laser
Pulsed laser deposition
Nanoparticles
Journal
IF:
6.9
Papers:
6.1W
Citations:
19.4W