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Fluoride-mediated oxidation protection of TiAl alloy: From processing to mechanisms
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DOI:10.1016/j.corsci.2026.114158.png)
Abstract
En 中文
• Optimal condition yields best oxidation resistance with 67% weight gain reduction. • Fluorine concentration governs fluorinated layer through precipitation-dissolution competition. • Dislocation networks at α-Al2O3/Ti3Al interface relieve misfit strains, securing scale adhesion. • F adsorption on TiAl alloy remains thermodynamically favorable from 1/16–1 ML.
Journal
IF:
8.5
Papers:
1.3W
Citations:
7.3W
