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GenPattern: dual-graph enhanced sewing pattern generation via multimodal large language model
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AI
DOI：10.1016/j.jmsy.2025.11.005.png)
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Abstract
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• Proposes GenPattern: a dual-graph enhanced MLLM for sewing pattern generation. • SewGraphFuser uses dual-graph to model geometry & semantics for MLLM. • SVG-style tokenizer enables precise, structured encoding of sewing patterns. • Integrated with HRCC platform for human-robot collaborative fabrication.
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