.png){kind=icon}
.png){kind=icon}
Return
Growth of Ultrahigh Density Vertically Aligned Carbon Nanotube Forests for Interconnects
.png){kind=icon}
PRE
AI
DOI：10.1021/nn1025675.png)
.png){kind=icon}
Original request for help.png){kind=icon}
Share.png){kind=icon}
Save
Abstract
En 中文
We present a general catalyst design to synthesize ultrahigh density, aligned forests of carbon nanotubes by cyclic deposition and annealing of catalyst thin films. This leads to nanotube forests with an area density of at least 10(13) cm(-2), over 1 order of magnitude higher than existing values, and close to the limit of a fully dense forest. The technique consists of cycles of ultrathin metal film deposition, annealing, and immobilization. These ultradense forests are needed to use carbon nanotubes as vias and interconnects in integrated circuits and thermal interface materials. Further density increase to 10(14) cm(-2) by reducing nanotube diameter is possible, and it is also applicable to nanowires.
Keywords:
carbon nanotubes
growth mechanism
chemical vapor deposition
catalyst design
high density forests
interconnects
AI Summary
Key information extracted from the uploaded paper, including a brief overview, abstract, background, key highlights, visual analysis, and future outlook.
Journal
IF:
16
Papers:
2.6W
Citations:
25.6W