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High-order diffraction for optical superfocusing
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DOI：10.1038/s41467-024-52256-y.png)
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Abstract
En 中文
High-order diffraction (HOD) from optical microstructures is undesirable in many applications because of the accompanying ghosting patterns and loss of efficiency. In contrast to suppressing HOD with subwavelength structures that challenge the fabrication of large-scale devices, managing HOD is less developed due to the lack of an efficient method for independently manipulating HOD. Here, we report independent manipulation of HODs, which are unexploited for subdiffraction-limit focusing in diffractive lenses, through an analytical formula that correlates the diffraction order and the width of each zone. The large spatial frequencies offered by the HODs enable our lenses to reduce the lateral focal size down to 0.44 lambda even without any subwavelength feature (indispensable in most high-NA diffractive lenses), facilitating large-scale manufacture. Experimentally, we demonstrate high-order lens-based confocal imaging with a center-to-center dry resolution of 190 nm, the highest among visible-light confocal microscopies, and laser-ablation lithography with achieved direct-writing resolution of 400 nm (0.385 lambda). The authors introduce the independent manipulation of high-order diffraction with a high-order diffractive lens for sub-diffraction limit focusing in confocal microscopy and laser ablation lithography.
Keywords:
SPATIAL-RESOLUTION
IMAGE-FORMATION
OPTIMIZATION
BINARY
PHASE
LIGHT
POLARIZATION
ULTRAVIOLET
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