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Interface-Engineered Highly Responsive ReS2 Photodetector
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DOI：10.3390/app151810058.png)
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Abstract
En 中文
Trap states in 2D transition metal dichalcogenides significantly affect the responsivity and response time of photodetectors, and previous ReS2/Si-based heterojunction photodetectors have struggled to simultaneously achieve high responsivity and fast response. To address this issue, we developed a n-type ReS2/p-type Si heterojunction photodetector through interface engineering. Specifically, the silicon substrate with a silicon dioxide dielectric layer was treated with inductively coupled soft plasma to adjust the thickness and surface states of the dielectric layer. This treatment created a multilayered heterostructure, which increased carrier concentration, effectively passivated sulfur-vacancy-induced defects, and thereby improved responsivity. Experimental results showed that the silicon-based n-type ReS2 photodetector achieved a responsivity of 0.88 A W-1 with a rapid response rise time of 2.5 s, a significant improvement from the intrinsic values of 12 mA W-1 responsivity and 6 s rise time. Additionally, due to the defect-tunable nature of this pretreatment technique, the device exhibited enhanced Raman peaks and intensified photoluminescence (PL) absorption features, confirming the effectiveness of the interface engineering in optimizing device performance.
Keywords:
interface engineering
ReS2 photodetector
responsivity
response time
plasma treatment
defect passivation
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