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Interferometric snapshot spectro-ellipsometry
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DOI：10.1364/OE.26.001333.png)
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Abstract
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We propose a snapshot spectroscopic ellipsometry and its applications for realtime thin-film thickness measurement. The proposed system employs an interferometric polarization-modulation module that can measure the spectroscopic ellipsometric phase for thin-film deposited on a substrate with a measurement speed of around 20 msec. It requires neither moving parts nor time dependent modulation devices. The accuracy of the proposed interferometric snapshot spectro-ellipsometer is analyzed through comparison with commercial equipment results. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
Keywords:
MULTILAYER THIN-FILMS
SPECTRAL INTERFEROMETRY
ELECTRON-MICROSCOPY
CHANNELED SPECTRUM
THICKNESS-PROFILE
ELLIPSOMETRY
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